You may try to use some sacrifical layers like MEMS guys do while they are
building for ex. bolometers..Do polymide+PR. Spin poly, pattern it , then use
suitable PR , deposit your bridge, lift-off, remove poly using KOH..
Regards,
O.ERKIN ULKER
+90 532 447 38 46
ANKARA TURKEY


--- 28/04/11 Per tarihinde basar bolukbas  şöyle
yazıyor:

> Kimden: basar bolukbas 
> Konu: [mems-talk] Air Bridge Fabrication
> Kime: "mems litho" 
> Tarihi: 28 Nisan 2011 Perşembe, 18:12
> Dear All,
>
> I want to make a air bridge fabrication, but i have some
> problems.
>
> When i spin-coat second resist layer on top of first one,
> my first layer is dissolving due to second resist's
> resolvent i guess.  I couldn't solve this problem even
> i tried different a lot of things.  So i couldn't make
> double photo lithography.
>
> Could you suggest some details to me?
>
> I will be appreciate for your great support.
>
> Thank you very much.
> Best Regards.
>
>
>
>
>
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