Hi Marc,

that is exactly the paper i cited in my first e-mail to memsnet group ;)

I wish to find other papers and potential applications.

Best regards,
Andrea

> Fabrication of large area ultrathin silicon membrane: Application for high
> efficiency extreme ultraviolet diffraction gratings*
> C. Constancias,a
 B. Dalzotto, and P. Michallon
> CEA Grenoble-MINATEC, 17 rue des Martyrs, F38054 Grenoble, France
> J. Wallace
> Center for NanoTechnology, University of Wisconsin-Madison, 425 Henry
> Mall,
> Suite 2130,
> Wisconsin 53706
> M. Saib
> CNRS-LTM Grenoble-MINATEC, 17 rue des Martyrs, F38054 Grenoble, France
> 
Received 20 July 2009; accepted 14 December 2009; published 28 January
> 2010
> Silicon membranes of 100 nm thick 
and below over several mm2 have been
> fabricated for high
> efficiency extreme ultraviolet 
EUV transmission grating. The perfect
> planarity 

1 nm and the
> high transparency 
80% at 13.5 nm wavelength have been measured. In
> comparison to SiNx
> membranes 
40% transmission, the silicon membranes allow high resolution
> EUV interference
> lithography using the second order diffraction of the molybdenum grating.
> The fabrication of such
> phase gratings has been performed and the diffraction efficiency
> measurement
> is 27% for the silicon
> membrane and the Mo grating. C 2010 American Vacuum Society. DOI:
> 10.1116/1.3290746
>
> Marco