Hello All, I have deposited a SiO2 film about 100nm on n-GaN as insulation by E-beam evaporator. but the quality is not so good, such as surface break when dipped in Actone solvent for hrs. And I want to apply the rapid thermal annealing on SiO2/GaN. Can anyone give some details about the annealing recipe for SiO2? -- Sincerely Jack, Zetao MA Dept.of EEE, CYC712,HKU