durusmail: mems-talk: 2 micron dielectric pillars
2 micron dielectric pillars
2012-11-20
2012-11-21
2012-11-21
2 micron dielectric pillars
Roger Shile
2012-11-20
If TEOS is the Si precursor for PECVD SiO2 deposition will be conformal.
SiH4 as a Si precursor will result in a much less conformal deposition.

Roger Shile

-----Original Message-----
From: mems-talk-bounces+rshile=nanoink.net@memsnet.org
[mailto:mems-talk-bounces+rshile=nanoink.net@memsnet.org] On Behalf Of
Gabriel Puebla-Hellmann
Sent: Tuesday, November 20, 2012 8:37 AM
To: 'General MEMS discussion'
Subject: [mems-talk] 2 micron dielectric pillars


Hi,

I need 2 micron high dielectric pillars with somewhat sloped sidewalls
for a project involving post deposition, lateral dimensions are 6 by 8
microns.
I'm currently using PECVD silicon oxide, which gives good slopes, but
due to the conformal nature of the deposition, also flags (see SEM
image), even with an undercut of more than 5 microns.
Does anyone have an alternative suggestion? Or a way of getting rid of
the flags/making the PECVD more directional? Unfortunately, a post
deposition wet-etching does not really work, 10 s in 20:1 BHF already
removes the entire structure. The oxide quality is low as the PECVD is
running at a low temp (120 deg) process to avoid resist melting/glass
transition.
Thanks for your input,
Gabriel

**************************************************************
Gabriel Puebla-Hellmann
ETH Zuerich
Laboratory for Solid State Physics
Quantum Device Lab
HPF D5
Schafmattstr.  16
8093 Zurich
Switzerland

Tel: +41 44 633 71 24

www.qudev.ethz.ch
**************************************************************


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