durusmail: mems-talk: RIE Etching Cr with PMMA Mask
RIE Etching Cr with PMMA Mask
2012-04-25
2013-01-12
RIE Etching Cr with PMMA Mask
冯跃
2013-01-12
The O2(90sccm)+CF4(6sccm) at relatively high pressure could remove 50
nm-thick Cr within 3 min.
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