Dear all,
      I am using SU-8 (2150), a negative photo resist for ultra thickness.
But during development it takes lot of time, likely 24 hour. May i know the
procedure how to develop to it as conventional ways. How do i striping out
SU- 8, with out affecting metal part of substrate.(I mean with out
introducing piranha cleaning).
--
With Best Regard,

Rajiv Panigrahi
Research Scholar
CeNSE, IISc, Bangalore (India)
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