I'm working on microfluidics and think I can use PDMS castings directly on my photoresist for square channels, but the resist looks like swiss-cheese up close when it's defocused to create a curved profile, so I think my only option is to pattern then isotropic etch, ash/wash away resist, then cast with PDMS. Seems that HF based solutions are my only google hits...I've used HF once or twice before and the local lab I plan on working in has HF already, but I remember being pretty wary of the HF. I occasionally bump or spill things, not /that/ often, but I'd rather play with safer chems if possible. I guess driving my car might be more dangerous statistically, but I feel there's a little more wiggle room in something like driving! Anyway, any recommendations would be great. I don't have any process setup yet so I'm flexible. -- -Nathan _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk