Hi Tony
E-beam patternning will result densification of HSQ to form SiO2 like state
but it is not hard? Enough to endure hot koh etch so it will be etch away
much faster than thermally grown oxide. So high concentration koh at high
temp will remove everything.
Typically highly diluted koh or tmah are used for developer for hsq e beam
litho. If you have conventionl photo developer then how about start with
that.

Myung Rae
2013. 10. 15. 오전 7:21에 "Ogbuu Okechukwu Anthony" 님이 작성:

> Hi all,
>  I am trying to etch a pattern on a device written on HSQ via E-beam.
> Currently, I am using KOH+IPA solution at 78 C as the etchant and the
> pattern disappears in few seconds.I am really confused why this occurs
> because I think HSQ interaction with electron beam produces amorphous SiO2.
>
> Please, have anybody done this. Thanks in advance for your responds
>
> Tony
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