Hi All, I have been working with THB 151N for some time now. I found it impossible to develop the 5 um resist widths which completely dissolves on developing. I have been using TMA238 developer and the resist thickness is 38-40um. I was wondering if changing the developer could help anyway. I need a very clean development of the resist. Many Thanks, Ricky Anthony Tyndall National Institute Lee Malting, Dyke Parade Cork, Ireland _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk