Hello everybody, A few weeks ago Dimitar posed an interesting question about issues exposing and SU8 with uncollimated lamp and that started me thinking about limits of such approach. Few days later I was myself in theoretical discussion about using uncollimated lamp as a light source for lithographic exposures. I believe that the main limitation is geometrical light travel path; that you basically expose parts of the substrate under severe angle which blurs your image, but I might be wrong. Does anyone of you is using uncollimated light source for contact/proximity exposure? What is the configuration you use (size of lamp, distance, resist thickness) and results do you achieve? Thanks for the answers. With best regards, Daniel _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk