That's far too great a roughness. It could be a dirty showerhead dropping
particles on the wafer. Or perhaps your discharge power is too great and
nitride is forming in the gas instead of reacting on the surface of the
wafer.

On Tue, Feb 17, 2015 at 4:07 PM, Matthieu Nannini, Dr. <
matthieu.nannini@mcgill.ca> wrote:

> Hi,
>
> I’m wondering how low the roughness could be on a SiN PECVD layer of 50 to
> 300nm ? anybody could share data ?
>
> Thanks
>
> -----------------------------------
> Matthieu Nannini
> McGill Nanotools Microfab
> Manager
> t: 514 398 3310
> c: 514 758 3311
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> http://mnm.physics.mcgill.ca/
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