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Dear MEMS researchers:

Could anyone comment the possibility of depositing 5 microns of silicon =
dioxide on top of 1 micron silver film; the substrate underneath is =
GaAs. We tried the oxide deposition using PECVD and the result was not =
very encouraging: lots of bubbles/pinholes were detected under the =
optical microscope and oxide film cracked once the sample was exposed to =
the atmosphere after taking it out from the deposition chamber. In =
addition, the adhesion between the oxide and the silver film were quit =
bad; the entire oxide were mostly peeled off. If anyone has any =
suggestion on the aforementioned issues, please do let me know.
Thank you very much!

Ricky Chuang
Graduate Student Researcher
University of California, Irvine
Dept. of Electrical and Computer Engineering


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Dear MEMS researchers:
 
Could anyone comment the possibility of depositing 5 =
microns=20
of silicon dioxide on top of 1 micron silver film; the substrate =
underneath is=20
GaAs. We tried the oxide deposition using PECVD and the result was not =
very=20
encouraging: lots of bubbles/pinholes were detected under the optical =
microscope=20
and oxide film cracked once the sample was exposed to the atmosphere =
after=20
taking it out from the deposition chamber. In addition, the adhesion =
between the=20
oxide and the silver film were quit bad; the entire oxide were mostly =
peeled=20
off. If anyone has any suggestion on the aforementioned issues, please =
do let me=20
know.
Thank you very much!
 
Ricky Chuang
Graduate Student Researcher
University of California, Irvine
Dept. of Electrical and Computer =
Engineering
 

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