Moderator's Note:

Ash Parameswaran's software (described below) for his novel mask-making
technique is available from the MEMS Clearinghouse (mems.isi.edu) by ftp:

    "/mems/tools/PSMASKMAKER"

and the WWW:

    http://mems.isi.edu/archives/tools/PSMASKMAKER/

- bill athas

    Mask-Making Technique from Ash Parameswaran param@cs.sfu.ca Simon Fraser
    University Burnaby, BC, Canada.

Economical Mask-Making Using Desk-Top Publishing Company

Hello Everyone,
I have been using the following method, for almost three years, to make masks
for some of our micromachining. I would like to make the technique and,
particularly, the software available for others. Before I seriously start
distributing all the material, I would like a few interested people to try this
technique and give me some feedback.

The following flow chart describes the technique:

 1. Design a mask layout using any layout software kic, magic, cadence,
    electric, cdl or anything
 2. Generate a CIF file
 3. Convert the CIF file to PostScript file using a software we developed. This
    creates a true scale PostScript geometry. i.e., if you design a 25-micron
    line in CIF, the PostScript file will have 25-micron geometry definition.
 4. Send the PostScript file to a local desktop publishing company and get a
    linotronic output. It will cost you approx. $18 for an A4-size output.
 5. You may use the linotronic output directly for bigger dimension lithography
    (say mm size and above)

    Or, you can contact print the linotronic image onto an emulsion plate and
    you can use that in a mask aligner.

Since most Canadian universities have some type or other of layout software and
can generate CIF files easily, this technique can be used to make some
economical masks for some of their in-house experiments.

I will initially supply a binary file (runs on sun4) of the true scale
CIF-to-PostScript converter, a sample CIF file, a sample PostScript file and an
instruction file (text). I will also include the name of the supplier of the
emulsion plates, and hints about exposure (very important), development and
rinsing.

Distribution Conditions:

    This material is the intellectual property of M. Parameswaran (Ash) of
    Burnaby, British Columbia. It is being provided 'as is', without support,
    and does not contain any warranties of fitness for any particular purpose.
    neither is it warranted that use will be error free or uninterrupted or
    that program defects will be corrected.