Hi, All

I would like to know how to etch Pt layer (on Si/SiO2/Ti, thickness 150nm)
with electrochemical method. As I know, there is a reference published on
"j. electrochem. soc., v123(1976), p703". But I can not get it here.
And also I want to know how to etch the Ni layer(thickness 15nm) with wet
chemical etchant which is safe to photoresist.

Any help is greatly appreciated.

Liu Weiguo
School of EEE
NTU, Singapore