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>From mems-mgr@ISI.EDU Fri Apr  9 23:34 MET 1999
From: "\9\Z\C\"\9\N" 
Subject: About SiO2 etching.
Date: Tue, 06 Apr 1999 18:12:21 KST
To: MEMS@ISI.EDU
X-Url: http://mems.isi.edu/mems.html

Hello. Everyone.
I wonder the etch rate of SiO2 using etchant BHF(1:10)
and the etch rate  using etchant KOH(10 wt %, DI).
Someone help me please.
Thanks a lot.
  My E-mail address is

               iampcm@hanmail.net
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