One can use Secondary ion mass spectroscopy by depth profiling to determine
the film thickness of various layers.  Ram


At 08:58 AM 4/19/99 -0500, you wrote:
>Greetings.
>You may be able to use the services of a metrology company like Thermawave
>(Model = optiprobe) or Tencor (UV1260?).
>
>Depending on the thickness of your films, you should be able to do
>multi-layer measurements with good goodness of fit.
>
>Goodluck.
>Jaideep
>
>
>At 01:17 AM 4/15/99 PDT, jae hong LIM wrote:
>>hi!
>>i wanna know the depth of layers.
>>i have 4 multi layer(silicon dioxide, silicon nitride, poly-silicon,
>>silicon nitride) wafer. but i don't know the way to measure the depth
>>of each layer during etching.
>>but i can't make a step.
>>because right now i can't use dry etch.
>>so i wanna use an ellipsometer.
>>if you have info about it let me know.
>>thanks in advance.
>>