Hi all: I am looking for a way to chemically etch Cu (or Ag) deposited onto a very thin alumina film (~10 nm) obtained by oxidation in air of a sputtered Al film. You understand that the alumina layer should absolutely not be etched by the etching solution for Cu or Ag. I was thinking of cyanides, but I have some concerns about the safety. I also don't know what the laws are about the use of cyanides in the US. Thanks to all of you, Giovanni =================================================== Dr. Giovanni ZANGARI Assistant Professor Dept. of Metallurgical and Materials Engineering University of Alabama P.O. Box 870202, 120 Bevill Building Tuscaloosa, AL 35487 Phone: (205) 348-7074 Fax: (205) 348-2164 e-mail: gzangari@coe.eng.ua.edu