Behraad: You don't have to re-invent XeF2 etching system. Our parent company FEI already has a system where we are routinely etching oxides using XeF2 inside a focused ion beam system. Check FEI's website www.feico.com for more details. If you need more information either you can contact FEI or you can call me at 503 640 0586. Thanks Jayant ************************************************************ Jayant Neogi CEO/President 3Beams Technologies Norsam Technologies Ph 503-640-0586/503-356-9197 Fax 503-640-8117 ************************************************************ -----Original Message----- From: Behraad Bahreyni [mailto:bahreyni@ee.umanitoba.ca] Sent: Tuesday, March 21, 2000 4:02 PM To: MEMS@ISI.EDU Subject: XeF2 Dear colleagues: I want to set up a XeF2 etching system (in its gaseous form not as a plasma) for etching Silicon, but I wonder whether it reacts with the oil (used in vacuum pump) or not (I'm worried about the formation of HF which can affect the future use of the chamber and pump) I also want to know what kind of valves I should use as the vacuums valve and what is the best material for the chamber itself. Can anybody help me with these questions? Thanks in advance, Behraad Bahreyni