Hello to all, I am looking for different approches to align precisely a photolithography mask to the crystallographic planes of silicon. The reason is simple, I will do an anisotropic wet etch with the transfered patterns and require them to be well aligned to the crystal structure for the etch to proceed properly. I work with standard 150mm {100} silicon wafers, but comments from other fields are welcome. Regards, Robert Antaki Implantation engineer, Mitel S.C.C. Bromont, Qc, Canada