To group I was wondering if there were any commercial services which could anisotropically etch thick SiO2. The thickness of SiO2 varies from 30 to 60 microns and is deposited on an Silicon substrate. The need is for prototype services on say ten, 4 and 6 inch wafers. If successful there would be a need to scale up the process to production levels. -- Keith Jackson Lawrence Berkeley National Laboratory Berkeley, Ca 94720 510-486-6894 voice 510-486-4955 fax