durusmail: mems-talk: Help Etching Silicon - Please?
Help Etching Silicon - Please?
Help Etching Silicon - Please?
Argonide Nanomaterials
2000-07-24
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Dear Colleagues,
Over time I've been a member of the group and have noticed how many
people come to the rescue for those in need of help. Well, now it's my
turn and I'm hoping someone out there can help me out with advice to any
or all questions.  Thanks in advance for your help.

Q1.  What is the preferred formulation for etching polycrystalline
silicon prior to metallization?
Q2.  What is the ratio of acid etchants (HF, nitric, acetic acid) for
removing the oxide from silicon?
Q3.  What are the preferred formulation for etchant for silicon dioxide?

Thanks again for the advice.

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 name="webmaster.vcf"
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 filename="webmaster.vcf"

begin:vcard
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tel;work:(407) 322-2500
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version:2.1
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end:vcard

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