Dear Sir, I am very glad to know In-situ Phos and Boron doped polysislicon film can be deposited by your lab. Would you mind helping us to deposit some in-siyu doped film? Our requirement is : 1) In-situ Phos(or As) doped polysilicon , thickness= 300nm, doping conc= 1e20cm-3 2) In-situ Boron doped ploysislicon, thickness = 500nm---1um, doping conc= 1e17cm-3 Can you reply to us as soon if you can do it, and also wish you can tell me how much money per wafer. Our wafer is 4 inches. Thank you very much. Best wishes, LIu Haitao -- Haitao Liu Tel: 852-23587074, 23587052 Fax: 852-23581485 Dept. of EEE HK Univ. of Sci & Tech.