durusmail: mems-talk: Need Resist/Developer Parameters or Delta-thickness Measurements
Need Resist/Developer Parameters or Delta-thickness Measurements
Need Resist/Developer Parameters or Delta-thickness Measurements
OxfordComp@aol.com
1996-01-28
Jan. 28, 1996

We are working in gray-scale lithography and need process parameters for an
apparently unusual combination, the modern versions of Shipley AZ1350J (now
AZ1518) resist and Shipley 303 (now MP303A) developer diluted 4:1, exposed at
G-line or I-line. We are using Prolith 3D from Finle Technology and need
process parameters we can use with it.

If some other system is more linear than this one, please let me know.

Alternatively, if someone can make some delta-thickness measurements on an
exposure matrix of these materials, that would be very helpful, too.

Thank you.

Regards,

Steve Morton, President
Oxford Computer, Inc.
39 Old Good Hill Road
Oxford, CT 06478
tel. 203-881-0891, fax 203-888-1146, e-mail: smorton@oxfordcomputer.com


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