sir,
I read your post from cleaning house.According to your recipe, i did KOH
etch experiment.but the result is much different.the etch rate is just 15
micron/hour.My case is the following
N type 3" wafer
250ml water
63ml isopropyl alcohol
57.9g 89.7% KOH
Temperature of soluation was maintained at 80 degree celsius.

would you like give me some suggestions? thanks

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