to strip the Nitride, I use the hot HF.
and I think it is better than hot phosphoric acid




Chang-Hwan Choi  wrote:
I want to ask about Silicon Nitride etching or strip. I will use a nitride
layer as a mask for Si etching. After Si etching, I will strip the nitride
layer by hot phosphoric acid. I guess it will take around 3 hours. As I
referred to some paper about nitride strip, I should use some heated bath
with reflux system. But, I have no idea of the equipment of the heated bath
with reflux system. I had just thought that I would use just some beakers
with the hot plate. I think that I can manipulate a similar condition to
the heated bath with beakers. But, I don't know how to do about reflux
system. Should I use the reflux system by any means? Can I strip a nitride
without reflux system by just dipping into beakers with hot phosphoric
acid? If I buy the heated bath with reflux system, where can I buy that?
And what is it called? Could you recommend a vendor and product name of a
heated bath with reflux system?

Thank you.

Regards, Chang.
Chang-Hwan Choi
Brown University
Division of Engineering, Box D
Providence, RI 02912, U.S.A.

Tel: (Home) 401-867-6017
        (Office) 401-863-2656
Fax: (Office) 401-863-9028
Email: chchoi@rocketmail.com
           Chang-Hwan_Choi@Brown.edu




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