I need to spin a 100 µm layer of thick positive photoresist. Does anybody
have an idea? I have tried a multi-spin approach with 6 layers of Shipley
SJR 5740, but I get problems with the baking - solvents still there or huge
stresses develops... Anybody have experience of multi-spin? I will also try
the micro resist ma-P 100. The idea is to make optical lenses by melting the
photoresist.

Thank you.

Tomas

________________________
Tomas Lindström, Ph.D.
Research & Development
Åmic AB
Uppsala Science Park
SE-75183 Uppsala
Delivery address:
Dag Hammarskjölds väg 52
Phone:  +46(0)18 521650
Mobile: +46(0)70 5289246
Fax:    +46(0)18 143250
Http:   www.amic.se