durusmail: mems-talk: Re: Thick photoresist: AZ 9260
Re: Thick photoresist: AZ 9260
Re: Thick photoresist: AZ 9260
Heike Bartsch de Torres
2001-04-27
Hi,
you can contact Karl Süss KG-GmbH&Co, Garching, near
Munich (Germany). They have a lot of experience.
Regards,
Heike
Heike Bartsch de Torres
Helmholtzring 2c
98693 Ilmenau
Germany
Phone: +49 3677 668272
Fax: +49 3677 668279
HB@LTF-GMBH.DE or macumbade@yahoo.de
--- Magali Brunet  schrieb: >
Dear all,
>
> I am trying to use the new photoresist of Clariant:
> AZ 9260 for
> achieving high structures, typically around 80 to
> 100 microns by a
> multilayer process. We are using an hotplate for the
> prebake. However,
> cracks appear after the exposure.
> Does anyone have a special receipe for this
> photoresist which could lead
> to a low stress layer?
>
> Thanks a lot in advance for your answers,
>
> Magali Brunet
>
> --
> PEI Technologies,
> NMRC, Lee Maltings, University College,
> Cork, Ireland.
>
> Tel: +353 21 4 904279
> Fax: +353 21 4 270271
> email: mbrunet@nmrc.ie
>
>


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