My name is James Brown and I am curently an undergrad student in Mechanical
Engineering at the University of Alberta.  I am working with one of my
professor's this summer on using SMA-based MEMS, but have come across a
problem when it comes to photoresist.  The problem is this: the SMA requires a
high-temperature anneal, so we need a photoresist that is resilient to
high-temperatures.  Does anyone know of such a photoresist, and possibly some
of the issues that may arise with using it (ie. toxicity, ease of use, etc.)

Thanking you in advance,

James Brown
Department of Mechanical Engineering
University of Alberta
Edmonton, Alberta