I want use PECVD nitride layer as a mask for KOH silicon etching. As far as I know, LPCVD nitride layer is ordinally used for mask film. How about PECVD nitride? Can I use PECVD nitrdie as a mask for KOH silicon etching like LPCVD nitride? If you happen to know, could you tell me the etch rate of PECVD nitride in KOH? Thank you. ===== Chang-Hwan Choi Brown University, Box D Division of Engineering, 182 Hope Street Providence, RI 02912, U.S.A. Tel: (401)867-6017(H), (401)863-2656(O), Fax: (401)863-9028 Email: chchoi@rocketmail.com, Chang-Hwan_Choi@Brown.edu __________________________________________________ Do You Yahoo!? Yahoo! Auctions - Buy the things you want at great prices. http://auctions.yahoo.com/