I wanted to etch cover glass up to 50um using Buffed HF with Shipley PR
1818 as an etching mask. However, the photoresist was stripped after 10 min
etching. Also the etching rate is only 500 angstrom /min. So could someone
tell me how to solve the etching mask problem and also introduce me a
faster etchant? Thanks

Tao YU
ECE Department
Colostate State University