durusmail: mems-talk: [Q] developing photoresist to form an angle
[Q] developing photoresist to form an angle
[Q] developing photoresist to form an angle
2001-11-26
[Q] developing photoresist to form an angle
Ashutosh Shastry
2001-11-26
hi,

thats the standard profile one wants when doing a lift off.  The process
for getting it is listed anywhere lift off is discussed. Moreau's book on
lithography is a good place.

good luck,

-Ashutosh-

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        Ashutosh Shastry                Research Associate,
        Graduate Student,               Microelectronics Group,
        School of  Biosciences and      Electrical Engineering Dept.,
        Bioengineering,
        Phone: 091-22-5721791           I.I.T. Bombay, INDIA 400 076.
        Email: shastrys@vsnl.com        Phone:091-22-5723655
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==
        O Traveller, there is no such thing as PATH...
                                        .....paths are MADE by walking.
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===




On Mon, 26 Nov 2001, 3k
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