Hello,

I am looking for a plasma chemistry for RIE etching E-glass, which is
composed of silicon dioxide, calcium oxide, aluminum oxide, boron oxide,
and trace amounts of sodium, potassium and magnesium oxides.  Silicon
dioxide is not a problem to RIE etch.  Thanks.

Sincerely,


Robert Dean

Research Associate IV
Center for Advanced Vehicle Electronics
Auburn University
200 Broun Hall
Auburn, AL 36849

Voice: 334-844-1838
Fax:   334-844-1898
Email: rdean@eng.auburn.edu