Hi, Use AZ1400 or 1350 as mask, RIE with CF4. You can design the lens with the depth between 0-2Pi, and it's easier for dry etching. 3 mask-aligning can make more than 90 diffraction efficiency. I think the group of Lincohn Lab of MIT and some companies such MEMS OPTICAL INC should have this kind of techniques. Good Luck, Hongjun Zeng, Ph.D. Microfabrication Applications Laboratory (MAL) University of Illinois at Chicago ERF Building, 842 W. Taylor Street Chicago, IL 60607-7022 Room 3014 ERF Tel.: 312-413-5889, Fax: 312-996-6465 **************************************************************************** ******************************** Message: 5 From: Ali RazaviTo: "'mems-talk@memsnet.org'" Date: Wed, 1 May 2002 12:27:34 -0400 Subject: [mems-talk] Question: Microlens Fabrication Reply-To: mems-talk@memsnet.org Hi, We plan to fabricate microlens arrays on quartz (fused silica). The diameter of each microlens is in the range of 50-200um and the f-# varies in the range of 2-10. We are considering to fabricate them using photoresist reflow followed by RIE. Therefore, I am very interested to find any reference that describes the fabrication process, including the type of resist, detailed process for both reflow and RIE. Do you have any recommendation? Thanks, -Ali :) ------------------------- Ali Razavi, Ph.D. Room 455, Manufacturing Research Center Gerogia Institute of Technology, Atlanta, GA 30332-0405 Phone: 678-637-1634, Fax: 404-894-9342 E-mail: arazavi@pmrc.marc.gatech.edu