Dear all;

I want to plasma etching Al film, in my experiment, the Al film thickness is
300nm~500nm, using photoresist AZ3100 as etching mask, I have
CHF3,SF6,O2,He2,Cl2, can you give me some advice about how to etching Al film?
what's the recipe?what's the important things must be noticed in the
experiments? thank you very much ahead!

best regards,

Lib.
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