I am currently doing some work in surface micromachining and have had some
difficulties in spinning photoresist onto wafers(5") with recessed structures
in the surface. After spinning on 1 micron of photoresist, I found the coating
to be very poor... I get radial streaks and terrible uniformity. Does anyone
know of an alternate photoresist coating process which does not require spin-on
techniques, or any other information which may enhance my uniforuniformity?

Thanks in advance,

Chris Cormeau
InterScience, Inc.
105 Jordan Rd.
Troy,NY,12180
(518)283-7500 Ph.
(518)283-7502 Fx.