Hi: My institute is looking for a research type spectrophotometer (NOT ellipsometer) to measure film thickness on various substrates (Glass, III-V, Cu, Al or Silicon). I have used the Leitz MV-SP Spectrophotometer before and hope to get a similar one. Below is the description for that system. Spectrophotometer uses optical methods to obtain quick, non-destructive thickness measurements of films from 10 nm to 15 µm thick. Measurement time is from 20 to 60 seconds and accuracy is quoted as plus-minus 3%. Measurements can be done inside geometries as small as four square micrometers (4 µm by 1 µm). Software is provided for measuring silicon dioxide, silicon nitride, polysilicon, polyimide, aluminum oxide, and photoresist. These films may be measured on silicon, aluminum, or III-V substrates. Programs are also provided for measuring the top layer of multiple film structures. In addition, other films and substrates can be added to the library. Pls. let me know if you have the contact source for the similar system from either Leitz or any other suppliers. Best Regards, Xiaosong Tang, Eric Senior research officer Institute of materials Research and Engineering Singapore 117602 xs-tang@imre.a-star.edu.sg Tel: 65-68748077 Fax:65-67741042