The following papers may be of some help:

Tabata et al., "Anisotropic Etching of Silicon in (CH3)4OH Solutions",
Transducers '91, pg 811-814, 1991

Merlos, et al., "TMAH/IPA anisotroipic etching characterstics",
Sensors & Actuators A, Vol. 37, pg 737-743, 1993

_________________________________________________________
Mark Sheplak
Microsystems Technology Laboratories and
Department of Electrical Engineering and Computer Science
60 Vassar Street
Room 39-561
Massachusetts Institute of Technology
Cambridge, MA 02139  USA
Phone: (617)253-6761
Fax: (617)253-8806
Email: sheplak@mtl.mit.edu
_________________________________________________________



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From: mehta@cs.sfu.ca
Subject: TMAH properties
Date: Thu, 24 Apr 1997 18:04:58 -0700 (PDT)
To: MEMS@ISI.EDU
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Reply-To: mehta@cs.sfu.ca

Hi everyone,

Does anyone know about the effect of TMAH selectivity of Silicon to
Silicon oxide with change in the TMAH concentration ?

I have not been able to find any paper which documents this, although
there a quite a few papers which talk about TMAH undercutting,
improving surface quality, decreasing Al etch etc..

Any pointers will be greatly appreciated....

Thanks...

Manish Mehta
email: mehta@cs.sfu.ca




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