Dear Franck,

Thanks for your comments on the wet etch resistance of SU-8....I would also like
to thank Gabriela and Frank on confirming what we at MicroChem believe to be the
problem with SU-8 and wet etchants such as KOH, in that it is the interface
between the SU-8 and the substrate that breaks down and not the SU-8 material
itself....However when it comes to dry etching we have been told and seen
evidence that it has a much higher selectivity than conventional Novolak
photoresists and therefore may be a better choice where high aspect ratio or
deep silicon etching is required....Should anybody require more information
please contact me....

Mark Shaw
Technical Sales & Applications Support
MicroChem Corp.

email: mshaw@microchem.com
url: www.microchem.com


Dear Kevin,
according to your reply you seemed to be able to use SU8 as a mask with KOH,
as it seems that nobody could do that experiencing lift-off (and maybe very
limited etching) it would be very nice if you could share some details that
could be added to http://aveclafaux.freeservers.com/su-8.html#top for
everyone's benefit!

Thank you in advance!
FranCk