Try Shipley 1045. It is a G-line PR.

Mihaela

-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org]On Behalf Of mennabli@grundfos.com
Sent: Monday, December 16, 2002 3:44 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] thick photoresist for dry etching



Dear members,
I am running a litho process line. For our dry etching process I need a
photoresist with a thickness of 6-9µm. It should have good thermal
resistance properties and good adhesion. Stability and reproducibility is
also a concern as the resist is going to be used in a production.
Step profile is not important as I have large structures. Could anybody
recommend a photoresist?

Mounir Ennabli, M. Sc. E. E.
Grundfos Semiconductor
Direct: +45 44 34 71 58
Fax: +45 44 34 71 72
e-mail: mennabli@grundfos.com

Grundfos a/s
BE>THINK>INNOVATE
mailing address: Ryttermarken 15-21, 3520 Farum
Denmark



_______________________________________________
MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/