Is any one aware or had experience with using dry film photoresists for
greyscale lithographic applications. A dry film with fairly low contrast is
desired such that greyscale photomask features can be replicated in the dry
films thickness accurately and repeatably.

Thanks,

Fred


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Fred Thomas
Iomega Corporation
Building 8
1821 West Iomega Way
Roy, Utah 84067
USA

email: thomasf@iomega.com