Try heated Shipley 1165 @ 70C until lift off. I noticed heated Shipley 1165 works better than heated nanostrip for some soft cured photoresists. Kevin Kim -----Original Message----- From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]On Behalf Of Timothy D. Meehan Sent: Thursday, February 13, 2003 5:45 PM To: mems-talk@memsnet.org Subject: [mems-talk] probs removing S1813 from glass after E-beam evap I am having difficulty doing lift-off of Shipley 1813 resist from glass following electron beam evaporation of Ti/Au. The evaporation follows standard photolithographic UV exposure and developing. The lift-off protocol I am using is sonication in acetone. Out of frustration I have even soaked the sample in nanostrip for an hour to no avail. Any advice would be appreciated. Tim Meehan Superfine Group Department of Chemistry University of North Carolina @ ChapelHill _______________________________________________ MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.memsnet.org/