Hi all, can anyone tell me if he'd worked with either:
NH4OH:H2O2:H2O(1:1:5)  or
H2O:H2O2:HF(20:1:1)
as etchants for Titanium? What was the etch rate, and do you know of the
selectivity over SiO2?
Thanks a lot,

Yair Gannot, Process Engineer
Wolfson Microelectronics Research Center
Dept. of Electrical Engineering
Technion, Haifa 32000, Israel
e-mail: syair@t2.technion.ac.il
tel:    972-4-8293291
fax:    972-4-8322185