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20um features using AZP4620 (李加东)
Selective etching between Cu and Ni / Ag (汪飞)
AFM scratch photoresist for nanograting (刘畅)
Dissolving carboxylate modified micro spheres stick to the PDMS channel walls (Mohammed Asfer)
Dissolving carboxylate modified micro spheres stick to the PDMS channel walls (Le Cao Hoai Nam)
Chemical Etchants for Ag (Sarosh Khwaja)
electroforming service (wang hong)
electroforming on nickel plate (howiewang)
20um features using AZP4620 (Haixin Zhu)
photo-defineable liquid polyimide (Haixin Zhu)
Selective etching between Cu and Ni / Ag (Gabriel Matus)
Entegris/Fluoroware IC trays (Xiaoguang Liu)
20um features using AZP4620 (Tolga YELBOGA)
20um features using AZP4620 (Robert Black)
20um features using AZP4620 (Haixin Zhu)
20um features using AZP4620 (Haixin Zhu)