durusmail
:
mems-talk
..
Contact-free cleaning of limestone on FS/Ta2O5 substrates (Roger Shile)
how to avoid air bubbles during imprint process (Xiaohui Lin)
make the su-8 surface flat (Khaled Mohamed Ramadan)
residual stress vs. thin film thickness (zhijian)
make the su-8 surface flat (Shane GUO)
residual stress vs. thin film thickness (Ruiz, Marcos Daniel (SENCOE))
Boron Nitride over SiO2 on Silicon wafers. (Ken Smith)
Etching 200 nm into a Saphirre Wafer (G. Puebla-Hellmann)