Hi, The etch rate in BOE is about 0.1 um/min [Madou, 1997] and you can use glass container for etching in KOH. Regards, Mahdi Bagheri --- Dhanamjaya R Gudawrote: > > > > > I have a question regarding the SiO2 etching which > I am planning to use as > the mask. > I want to use BOE as the etchant.Does any one > have any particular idea > about the etch rate of SiO2 in BOE ( what would be > the concentration > profile). and > what conatiner can i use for etching of Silicon > using KOH. > I would really appriciate if any one go a head and > answer to these > questions. > > Thanks, > Dhanamjaya Reddy Guda > Louisiana State University, > Department of Mechanical Engineering > Ph.No: 225-578-4412 > > > _______________________________________________ > MEMS-talk@memsnet.org mailing list: to unsubscribe > or change your list > options, visit > http://mail.mems-exchange.org/mailman/listinfo/mems-talk > Hosted by the MEMS Exchange, providers of MEMS > processing services. > Visit us at http://www.memsnet.org/ > __________________________________ Do you Yahoo!? Yahoo! Mail - Helps protect you from nasty viruses. http://promotions.yahoo.com/new_mail