Hi,

   The etch rate for 5:1 BOE is typically

~1000 A/min for Thermal Oxide
~4900 A/min for Unannealed PECVD
~2400 A/min for annealed PECVD

I am not sure what you mean by concentration profile.

The container used for BOE etching is some type of teflon container
Ther container used for KOH etching is a pyrex beaker.

Phil Tabada

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