Hi, Rick, Thanks for your reply. I plan to use CF4. Do you think 10 sccm O2 flow rate would do the work? I am afraid that would be way too low. Richard ----- Original Message ----- From: "Richard H. Morrison"To: "General MEMS discussion" Sent: Monday, April 03, 2006 12:27 PM Subject: RE: [mems-talk] Pattern cross-linked SU-8 >I have etched SU8 (crosslinked) using RIE O2 flow = 99sccm and SF6 flow = >5sccm with 500w you get around 0.75um/min. You need the SF6 to help etch >the Silane groups that are in the SU8, otherwise you get a surface full of >black dots and it is very rough. > > Rick > > Rick Morrison > Senior Member of the Technical Staff > The Charles Stark Draper Laboratory