Also, Trying to expose on a highly reflective surface , if you have a narrow band exposure system, you end with a thin layer on un-exposed resist at the bottom, Try post exposure bake and if it doesn't help, descum Shay -----Original Message----- From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org] On Behalf Of Scott McWilliams Sent: Tuesday, September 19, 2006 4:37 PM To: General MEMS discussion Subject: Re: [mems-talk] Minimum feature size using wet etching - 3micro-m? Hi Martyn, is it possible that you would require a descum step before the wet etch? I fabricate gratings of a similiar period and my process requires and O2 plasma or O3 descum before wet etching to insure the resist is really clear in the troughs. I am assuming you have a 50% duty cycle of the gratings and it is sometimes difficult to clear out the troughs when you have a sinusiodal profile. Lastly, are you using an anti-reflection coating? Patterning on metal can be challenging.