Hi All, I am trying to deposit SU-8 over thermal oxide. SU-8 is part of the final device I am fabricating, so I want it to adhere to the substrate strongly. But with my current recipe SU-8 delaminates after development. Following are the some process specs I am following. SU-8 2100 Thickness: 200-250um Softbake: 15min @65C, 100min @95C. UV Dose: I have tried 400mJ/cm2 to 1000mJ/cm2 Hard Bake: 5min @65C, 20min @ 95C. Development time: 10-20min. I have tried using primers like HMDS, P20. Also I have tried using Omicoat. What could be the possible reason for this? or SU-8 does not adhere to thermal oxide at all? Thanks, Prakash