durusmail: mems-talk: Adhesion BPR100 resist on AuZn
Adhesion BPR100 resist on AuZn
2007-01-12
2007-01-12
Adhesion BPR100 resist on AuZn
Bill Moffat
2007-01-12
Vacuum vapor prime creates perfect adhesion between organic and inorganic
material. The vacuum/hot nitrogen purges dehydrate the surface completely and
the vapor of HMDS never sees moisture.  Result in thousands of installations a
perfect adhesion layer that never changes.  We have total success shipping
treated wafers overseas.  Send us some wafers we will treat for free.

Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353
cell 408 590 4577
bmoffat@yieldengineering.com
www.yieldengineering.com

-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org] On
Behalf Of P.E.M. Kuijpers
Sent: Thursday, January 11, 2007 11:48 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Adhesion BPR100 resist on AuZn

Hello,

Does anyone know how to improve the adhesion of BPR100 resist (20µm) on an 200nm
AuZn layer. At this moment patterns are flushed away during spraydevelopment.
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